Delivery and installation of an ICP Reactive ion etcher for silicon dielectrics
- 采购方
- udbud_dk
- 机构全称
- Danmarks Tekniske Universitet - DTU (CVR 30060946)
- 国家/地区
- Denmark
- 截止时间
- 2026-11-23
- 发布时间
- 2026-10-12
- 公告编号
- 00701524-2026
- 预算/金额
- 0.00
- 来源编号
- UDBUD-0a646b33-68e6-4139-9a0c-af6045862a0e
公告概况
DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for silicon oxides and nitrides to become its new primary instrument for 150 mm wafer processing. Delivery is expected no later than Q3 2027. The Instrument will be installed in the DTU Nanolab cleanroom - a university facil
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